The University of Sheffield
Electron Beam Lithography

Selected Publications

Nanoscale Conjugated-Polymer Light-Emitting Diodes

F.A. Boroumand, P.W. Fry, D.G. Lidzey. Nano Letters 5, 67 (2005)

Abstract:
We use e-beam lithography to pattern an indium tin oxide (ITO) electrode to create arrays of conjugated-polymer LEDs, each of which has a hole-injecting contact limited to 100 nm in diameter. Using optical microscopy, we estimate that the electroluminescence from a 100 nm diameter LED comes from a region characterized by a diameter of similar to170 nm. This apparent broadening occurs due to current spreading within a PEDOT:PSS layer which was included to aid hole injection.

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Observation of ultrahigh quality factor in a semiconductor microcavity

D. Sanvitto, A. Daraei, A Tahraoui, M. Hopkinson, P.W. Fry, D.M. Whittaker,
M.S. Skolnick, Applied Physics Letters 86, 191109 (2005)

Abstract:
Observation of a very high-quality factor (Q) of 30,000 is reported for a planar semiconductor microcavity grown by molecular-beam epitaxy using in situ optical monitoring. The very high Qs are measured in pillars of 5 - 10 μm diameter, and are approximately a factor of 3 higher than measured in planar structures before etching. The higher values in the pillars are ascribed to the elimination of the effects of in-plane dispersion, diffraction, and lateral inhomogeneities, thus allowing the intrinsic Q of the planar structure to be observed. Spectrally resolved mode mapping is reported, accounting qualitatively for the decrease of Q with increasing mode number in the pillars.

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